TITANPORT D (DIALYSIS) > Usage information > double lumen
USAGE INFORMATION

INDICATIONS

The TITAN-PORT D allows repeated vascular access for veno-venous dialysis in dialysis-dependent kidney failure

KONTRAINDIKATION

TITAN-PORT D Systeme dürfen nicht eingesetzt werden bei:

COMPLICATIONS and possible side effects

The following are examples of general complications and possible side effects:

APPLICATION NOTES: PORT IMPLANTATION

Warning: It is essential to ensure aseptic conditions during implantation!
Selection, decision-making and technique are the responsibility of the physician performing implantation.
Implantation is normally performed under insufflation anesthesia.
The internal jugular vein is the typical site for implantation with alternative locations also possible.
The following represents an example of the possible or standard surgical implantation technique.

PREPARATION

  1. Expose the internal jugular vein
    (supraclavicular incision)
  2. Apply distal and proximal loop ligatures
  3. Subclavicular incision
  4. Subcutaneous tunnel between the two incisions
  5. Subcutaneous preparation of a recess
  6. Move the catheter tip from the sub-clavicular incision to the supraclavicular incision via the subcutaneous tunnel.
  7. Small phlebotomy (caution air embolism!). Insert catheter tip 15-20 cm up to the superior vena cava or atrium (positional check by intraatrial ECG tracing or by x-ray fluoroscopy)
  8. Pursestring suture at the phlebotomy.
  9. Connect catheter end to the port.
  10. Slide the catheter end onto the port outlet tube and secure by squeezing the cuff.
  11. Position the port chamber subcutaneously as far as possible from the cutaneous incision, and secure if necessary.
  12. Cutaneous suture
  13. With optimum implantation, the system can be used immediately.

CARE OF THE SYSTEM / SPECIAL APPLICATION NOTES

- On each occasion before treatment, ensure the correct position of the port chamber by palpation and check that there is no wound or infection present.

USER INSTRUCTIONS

Caution:

Causes for abnormally high puncture resistance can include:

(The stated concentrations are recommendations and must always be adapted to individual patient requirements and are the responsibility of the therapist. Medication and solutions employed are basically subject to the directions provided by the pharmaceutical manufacturers. Attention must be given to the specific requirements of the dialysis. The port systems provide only an access route for veno-venous dialysis and have no influence on the function itself).

INDICATIONS FOR EXPLANTATION

WARNING NOTES

After a lengthy implantation period or system use, check the membrane for leakage resulting from frequent punctures.
Where there are no complications, a puncture frequency of up to approx. 1000 punctures using a special needle allows a corresponding implantation time depending on the frequency of dialysis.

PRECAUTIONS

Meticulous hygiene and sterile handling technique are mandatory for this system, e.g.

MONITORING

Regular usage followed by system care and maintenance provide continuous monitoring.

The system should not be used by physicians / medical staff who are not familiar with the product and/or possible complications. These can occur at any time during or after the intervention.

Prior to use, the packaged product should be stored in dry conditions as far as possible at temperatures of 5° - 35° C and should be protected from direct sunlight.
Do not use products from damaged packaging.